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Solution

Solution

Offering

  • Minimizes moisture with dry cleaning technology
  • Moisture minimization technology with nitrogen purge packaging method
  • Ion cleaning technology chelate
  • Quantitative moisture evaluation through RGA
  • Quantitative ion analysis through ChemTrace ICP-MS, and IC

Benefit

  • Ultra Clean Part’s
  • Reduces the level of contamination and facility operation time
  • Control change of process through excellent metallic ion management

Application

  • LAM, TEL, AMAT, ULVAC, SEMES etc.

Applicable Technology

Technology Name Technology Full Name Technology Detail Brochure
PBC™ Pulse Beam Clean Deposition removal technology using pulse beam
NPP™ Nitrogen Purge Package Packaging technology using nitrogen purge
TIC™ Tornado Ion Clean Metallic positive ion removal technology using chelate
MPS™ Micro Powder Spray Pellet Size CO2 cleaning technology
PSC™ Pure Surface Clean Snow Size CO2 cleaning technology